Photolithography
Headway Spin Coater
Headway PWM32-PS-R790
Standard Operating Procedure
Description:
Used for evenly coating a substrate with photoresist.
Features:
Programmable Controller
10,000 RPM Motor
15" Diameter Steel Bowl
Vacuum chuck
Vacuum On/ Off Valve
Hot Plate
VWR(R) Standard
Description:
N/A
Features:
4"x4" (10.2 x 10.2 cm) aluminum top
Digital display
5 °C (above RT) to 400 °C
Adjustable in 1 °C increments
Beeps at Set point
OAI Mask Aligner
OAI Series 200
Standard Operating Procedure
Description:
For parallel mask alignment and UV photoresist removal.
Features:
5" Masks
Up to 4" Wafers
5x, 10x, and 2x objectives
Nominal 1 µm Resolution
2 µm Accuracy
Vacuum contact
Hard Contact